On Correlation between Visible-Near-Infrared Transmittance Spectra and Structural Properties of Plasma Deposited Nanocrystalline Silicon Thin Films
Küçük Resim Yok
Tarih
2016
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Amer Inst Physics
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
Visible-near-infrared transmittance (T) spectra is correlated with the structural properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films, produced by plasma enhanced CVD (PECVD) under various RF power densities (100-444 mW/cm(2)), various substrate temperatures (80-200 degrees C), at different regions of the PECVD electrode (center/edge). It is found that for the highly crystalline films there is downward deviation of maximum T envelope curve (T-M) from the glass substrate T (T-substrate) in 650-900 nm region, and it is linearly proportional to grazing angle XRD (GAXRD) (111) peak height. Field emission SEM (FE-SEM) surface reveals conglomerates for these films. T-M approximate to T-substrate for the films with low GAXRD (111) peak height or fully amorphous samples, which have partially or fully smooth FE-SEM film surface, respectively. The effect of each film structural property (surface roughness, columns, incubation layer, etc.) on the observed deviation of T-M from T-substrate is considered.
Açıklama
9th International Physics Conference of the Balkan-Physical-Union (BPU) -- AUG 24-27, 2015 -- Istanbul Univ, Beyazit Campus, Istanbul, TURKEY
Anahtar Kelimeler
Kaynak
9th International Physics Conference of the Balkan Physical Union (Bpu-9)
WoS Q Değeri
N/A
Scopus Q Değeri
N/A
Cilt
1722
