Tezel, Fatma MeydaneriVeli, UgurKariper, I. . Afsin2024-09-292024-09-2920222352-4928https://doi.org/10.1016/j.mtcomm.2022.104962https://hdl.handle.net/20.500.14619/5166In this study, MgO thin films were grown using Chemical Bath Deposition (CBD) and annealed at various tem-peratures (300, 350, 400, and 450 degrees C). Their structural properties were obtained by X-ray diffraction (XRD), and amorphous MgO structures were observed in the XRD pattern. EDX composition analysis showed that the amount of Mg increased with temperature, and so did oxidation. Surface morphologies and surface roughness were analyzed by FESEM and AFM. The amorphous structures were in the form of a sugar cube at 300 degrees C and turned into a homogeneous nanorod-like structure as the temperature increased to 400-450 degrees C. Current-voltage (I-V) measurements were taken with a Keithley 2400 sourcemeter, and electrical resistivity was calculated using film thickness. The increase in surface roughness created a resistance effect in transmission, reducing the charge storage capacity. The transmittance (T), reflectance (R), refractive index (n), and damping coefficient (k) were determined via a UV-vis spectrophotometer. Eg values of MgO thin films tempered at 300, 350, 400, and 450 degrees C were 3.85, 3.98, 3.87, and 4.08 eV, respectively.eninfo:eu-repo/semantics/closedAccessMagnesium oxideAnnealingThin filmsNanorodsRoughnessOptical propertiesStructural propertiesArticle10.1016/j.mtcomm.2022.1049622-s2.0-85144278123Q233WOS:000892565400001Q2