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    Dielectric properties, electric modulus and conductivity profiles of Al/Al2O3/p-Si type MOS capacitor in large frequency and bias interval
    (Elsevier - Division Reed Elsevier India Pvt Ltd, 2022) Tan, Serhat Orkun; Cicek, Osman; Turk, Cagri Gokhan; Altindal, Semsettin
    The letter reports that the impedance spectroscopy method has been performed to acquire impeccable results on the ac electric conductivity (sigma(ac)) dielectric (epsilon' and epsilon '') and electric modulus (M' and M '') components of the Al/Al2O3/p-Si type MOS capacitor. The relevant parameters are defined with C-V-f and G/omega-V-f data between 1 kHz and 5 MHz and +/- 3 V at room temperature. Both parts of dielectric constants are decreasing at high frequencies to prevent the interface dipoles from gaining enough time to return to the alternative area. Depending on the restructuring and reorganization of surface states (N-ss) in the alternative field, tan delta decreases at higher frequencies. The M' values reach maximum by frequency increment in the depletion region, while M '' values shift to the forward biases depending on a certain density distribution of N-ss. The sigma(ac) values increase with increasing frequency in the accumulation region depending on series resistance. Considering polarization processes, surface conditions (N-ss) and Al2O3 interlayer, frequency and biases are extremely effective and dependent on the dielectric specifications, electrical modulus and conductivity. (C) 2021 Karabuk University. Publishing services by Elsevier B.V.
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    Frequency and voltage dependence of barrier height, surface states, and series resistance in Al/Al2O3/p-Si structures in wide range frequency and voltage
    (Elsevier, 2020) Turk, Cagri Gokhan; Tan, Serhat Orkun; Altindal, Semsettin; Inem, Burhanettin
    In this study, Al/Al2O3/p-Si (MIS) type structures were fabricated and then the effects of Al2O3 interlayer on the electrical characteristics have been investigated at room temperature. For this purpose, capacitance/ conductance-voltage-frequency (C/G-V-f) measurements were performed in the wide range frequency (1kHz-5 MHz) and voltage (+/- 3 V) to get more reliable and accuracy results on the barrier height (BH) formation at Al/p-Si interface, conduction mechanisms, and main electrical parameters. Experimental results indicate that C and G/omega values are strong function of frequency and voltage particularly in the regions of accumulation and depletion. Calculating from the interception and slope of C-2-V plot, the doping acceptor atoms (N-A), BH and depletion layer width (W-D) were obtained for each frequency, respectively. Both BH and W-D values exponentially increase by frequency increment. Nicollian-Brews method were used to extract voltage dependence profiles of R-s and frequency from C and G data.