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Öğe Determination of Optimum Test Parameter Level Ranges for Machining Processes(Dr D. Pylarinos, 2024) Alabayed, M.A.K.; Alghatous, S.A.S.; Ozarpa, C.; Korkmaz, S.; Cetin, M.H.; Basher, I.S.A.In this study, the ideal experimental design planning for the machining process was investigated. Two experimental designs were created by differentiating the parameter levels considered in the drilling process of stainless-steel. Close and far-level designs were obtained by creating 20% and 40% differences between the parameter levels. In the experimental system prepared according to the Taguchi method, surface roughness and cutting forces were measured as the output parameters. The results were analyzed statistically by optimization, analysis of variance and correlation analysis, and visually by chip morphology examination. According to the findings, it was determined that a 20% difference between the parameter levels was more appropriate in terms of experimental system stability, statistical data significance, and chip morphology. © by the authors.Öğe Effects of deposition temperatures on the supercapacitor cathode performances of GO:SnSbS/Si thin films(Elsevier, 2021) Korkmaz, S.; Tezel, F. Meydaneri; Kariper, I. A.; Serin, A.The performances of the new generation energy storage devices are strongly dependent on the physical and chemical properties of the electrode materials; therefore, the development of high-activity electrode materials is of great importance. For this purpose, Graphene oxide: Antimony sulfide (on Si substrate) thin films were produced at different deposition temperatures via chemical bath deposition (CBD) and their supercapacitor performances were investigated. Specific capacitance values were calculated through time-dependent current-voltage (I-V) measurements in the range of -0.2 V - 0.8 V, at 5 mV/s, 10 mV/s and 20 mV/s scanning rates. The maximum specific capacitance for each deposition temperature at scanning rate of 5 mV/s was found to be 562 F/g, 549 F/g, 401 F/g and 254 F/g, respectively.Öğe Facile synthesis and characterization of graphene oxide/tungsten oxide thin film supercapacitor for electrochemical energy storage(Elsevier, 2020) Korkmaz, S.; Tezel, F. Meydaneri; Kariper, I. A.The capacitance performance exhibited by Graphene oxide/Tungsten Oxide substances is quite high in terms of potential supercapacitor applications. This study involves the synthesize of GO through Hummers Method and coating it on the substrates. Accordingly, thin film supercapacitor structures of GO/WO3 on ITO, FTO, PMMA and Glass substrates were successfully produced through CBD (Chemical Bath Deposition) method. Structural properties were characterized by XRD, SEM, AFM, ATR, and UV. I-V and C-V curves were investigated in the determined voltage range (from -0.2-1.2 V) at 25, 50, 75 and 100 mV/s various scanning potential. Regarding the maximum capacitance and energy intensity of the thin films, the maximum capacitance was 268.5 F/g and the energy intensity was calculated as 52.2 Wh/kg for glass/GO/WO3 thin film; the maximum capacitance was 259.7 F/g, and the energy intensity was calculated as 50.4 Wh/kg for PMMA/GO/WO3, the maximum capacitance was 158.5 F/g, and the energy intensity was calculated as 30.8 Wh/kg for FTO/GO/WO3, and finally the maximum capacitance was 106 F/g, and the energy intensity was calculated as 20.6 Wh/kg for ITO/GO/WO3.Öğe Reduced graphene oxide/molybdenum oxide thin films and its' capacitance properties: Different substrates effect(Elsevier, 2021) Korkmaz, S.; Tezel, F. Meydaneri; Kariper, I. . A.This study used the Chemical Bath Deposition method, which is quite simple and cheap, to produce GO/MoO3 nanocomposite, whose high capacitance properties draws attention. The Graphene oxide solution is prepared by synthesizing through the Hummer Method. These two materials were left to grow slowly on their own so that GO/MoO3 nanocomposite structures form thin films on Glass, Poly(methyl methacrylate), Fluorine tin oxide, and indium tin oxide substrates. The surface and structural properties of these GO/MoO3 nanocomposite structures were characterized by Scanning Electron Microscopy, Energy Dispersive X-ray, FTIR, X-ray diffraction, and Atomic Force Microscopy. The nanocomposites' capacitance properties produced on different substrates were measured in -0.2 - 0.2 V at different scan rates. As a result, the highest specific capacitance values were achieved at 25 mV/s scan rate, as 587 F/g, for Poly(methyl methacrylate).Öğe Synthesis and characterization of GO/IrO2 thin film supercapacitor(Elsevier Science Sa, 2018) Korkmaz, S.; Tezel, F. Meydaneri; Kariper, I. A.Graphene oxide - Iridium Oxide structures show high capacitance performance potential in terms of applications in supercapacitors. The scope of this study is synthesizing GO via Hummers Method and use it for the coating of various substrates. Accordingly, various supercapacitors in the form of thin film, namely glass/GO/IrO2, PMMA/GO/IrO2, ETO/GO/IrO2 and ITO/GO/IrO2, were successfully produced via chemical bath deposition (CBD) on various substrates. Structural characterizations were analyzed through SEM, XRD, ATR, UV and AFM. In addition, I-V and C-V characteristics were investigated and energy densities were calculated for a voltage range (from -0.2 to 1.2 V), at scanning speed of 25 mV/s, 50 mV/s, 75mV/s and 100mV/s. It was found that all thin films supercapacitors structures (glass/GO/IrO2, PMMA/GO/IrO2, FTO/GO/IrO2 and ITO/GO/IrO2) reached their maximum capacitance values at the scanning rate of 25 mV/s, which were found to be 551.7 F/g, 837.7 F/g, 433.2 F/g and 569.7 F/g; and the energy intensities were calculated as 15.3Wh/kg, 34.9Wh/kg, 7.2Wh/kg and 12.64 Wh/kg respectively. (c) 2018 Elsevier B.V. All rights reserved.Öğe Synthesis and Characterization of GO/V2O5 Thin Film Supercapacitor(Elsevier Science Sa, 2018) Korkmaz, S.; Tezel, F. Meydaneri; Kariper, I. A.For potential applications in supercapacitors, Graphene oxide - Vanadium oxide structures exhibit high capacitance performance. In this study, GO was synthesized by Hummers Method and coated on substrate materials. Then, thin film supercapacitors glass/GO/VO, PMMA/GO/VO, FTO/ GO/VO and ITO/ GO/VO were fabricated successfully by chemical bath deposition method (CBD). Structural characterizations were investigated by SEM, XRD, FTIR, UV-VIS and AFM. I-V and C-s-V characteristics were investigated and energy densities were calculated at voltage range (from -0.2 to 1.2 V) at scanning potential 25, 50, 75 and 100 mV/s. At the scanning rate of 25 mV/s, the maximum capacitance values for glass/GO/VO, PMMA/GO/VO, FTO/GO/VO and ITO/GO/VO thin film supercapacitors structures were 880 F/g, 806.6 F/g, 949.6 F/g and 563.2 F/g; and the energy intensities were calculated as 85.4 W h/kg, 44.8 W h/kg, 15.78 W h/kg, 23.4 W h/kg, respectively.Öğe The synthesis of GO: SnSbS thin films and the analysis of its electrochemical performance(Elsevier Science Sa, 2020) Tezel, F. Meydaneri; Korkmaz, S.; Serin, A.; Kariper, I. A.[No abstract available]
